JPH0342461B2 - - Google Patents
Info
- Publication number
- JPH0342461B2 JPH0342461B2 JP1622583A JP1622583A JPH0342461B2 JP H0342461 B2 JPH0342461 B2 JP H0342461B2 JP 1622583 A JP1622583 A JP 1622583A JP 1622583 A JP1622583 A JP 1622583A JP H0342461 B2 JPH0342461 B2 JP H0342461B2
- Authority
- JP
- Japan
- Prior art keywords
- photoresist
- absorbing agent
- light absorbing
- hydrogen atom
- photosensitive composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 229920002120 photoresistant polymer Polymers 0.000 claims description 40
- 239000006096 absorbing agent Substances 0.000 claims description 38
- 239000000203 mixture Substances 0.000 claims description 23
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 8
- 150000001875 compounds Chemical class 0.000 claims description 7
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 7
- 241000270708 Testudinidae Species 0.000 claims description 5
- 229920003986 novolac Polymers 0.000 claims description 5
- 229920000642 polymer Polymers 0.000 claims description 5
- -1 azo compound Chemical class 0.000 claims description 4
- 241000270666 Testudines Species 0.000 claims description 3
- 125000000217 alkyl group Chemical group 0.000 claims description 3
- 125000003277 amino group Chemical group 0.000 claims description 2
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 2
- 230000000694 effects Effects 0.000 description 10
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 9
- 229910052782 aluminium Inorganic materials 0.000 description 9
- 230000000052 comparative effect Effects 0.000 description 9
- 238000000034 method Methods 0.000 description 7
- 239000000047 product Substances 0.000 description 7
- 230000035945 sensitivity Effects 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 4
- 238000001259 photo etching Methods 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 238000009792 diffusion process Methods 0.000 description 3
- 239000003921 oil Substances 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 238000000859 sublimation Methods 0.000 description 3
- 230000008022 sublimation Effects 0.000 description 3
- WQMWHMMJVJNCAL-UHFFFAOYSA-N 2,4-dimethylpenta-1,4-dien-3-one Chemical compound CC(=C)C(=O)C(C)=C WQMWHMMJVJNCAL-UHFFFAOYSA-N 0.000 description 2
- AYKNBEUSHQHYSX-UHFFFAOYSA-N 4-[(4-ethoxyphenyl)diazenyl]-n,n-diethylaniline Chemical compound C1=CC(OCC)=CC=C1N=NC1=CC=C(N(CC)CC)C=C1 AYKNBEUSHQHYSX-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- 230000002745 absorbent Effects 0.000 description 2
- 239000002250 absorbent Substances 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- 229920002454 poly(glycidyl methacrylate) polymer Polymers 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- WOAHJDHKFWSLKE-UHFFFAOYSA-N 1,2-benzoquinone Chemical compound O=C1C=CC=CC1=O WOAHJDHKFWSLKE-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- NGPGYVQZGRJHFJ-BUHFOSPRSA-N 4-(4-nitrophenylazo)resorcinol Chemical compound OC1=CC(O)=CC=C1\N=N\C1=CC=C([N+]([O-])=O)C=C1 NGPGYVQZGRJHFJ-BUHFOSPRSA-N 0.000 description 1
- JCYPECIVGRXBMO-UHFFFAOYSA-N 4-(dimethylamino)azobenzene Chemical compound C1=CC(N(C)C)=CC=C1N=NC1=CC=CC=C1 JCYPECIVGRXBMO-UHFFFAOYSA-N 0.000 description 1
- CQKQINNUKSBEQR-UHFFFAOYSA-N 4-[[4-(dimethylamino)phenyl]diazenyl]phenol Chemical compound CN(C)c1ccc(cc1)N=Nc1ccc(O)cc1 CQKQINNUKSBEQR-UHFFFAOYSA-N 0.000 description 1
- XUWHYFCWTFFFPS-UHFFFAOYSA-N 5-(dimethylamino)-2-phenyldiazenylphenol Chemical compound C1(=CC=CC=C1)N=NC1=C(C=C(C=C1)N(C)C)O XUWHYFCWTFFFPS-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- SJJISKLXUJVZOA-UHFFFAOYSA-N Solvent yellow 56 Chemical compound C1=CC(N(CC)CC)=CC=C1N=NC1=CC=CC=C1 SJJISKLXUJVZOA-UHFFFAOYSA-N 0.000 description 1
- 239000011358 absorbing material Substances 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 150000001555 benzenes Chemical class 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- IIEWJVIFRVWJOD-UHFFFAOYSA-N ethyl cyclohexane Natural products CCC1CCCCC1 IIEWJVIFRVWJOD-UHFFFAOYSA-N 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 239000013557 residual solvent Substances 0.000 description 1
- 239000011342 resin composition Substances 0.000 description 1
- 230000004083 survival effect Effects 0.000 description 1
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 1
- 230000037303 wrinkles Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
Landscapes
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1622583A JPS59142538A (ja) | 1983-02-04 | 1983-02-04 | 感光性組成物 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1622583A JPS59142538A (ja) | 1983-02-04 | 1983-02-04 | 感光性組成物 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59142538A JPS59142538A (ja) | 1984-08-15 |
| JPH0342461B2 true JPH0342461B2 (en]) | 1991-06-27 |
Family
ID=11910592
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1622583A Granted JPS59142538A (ja) | 1983-02-04 | 1983-02-04 | 感光性組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59142538A (en]) |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61241759A (ja) * | 1985-04-18 | 1986-10-28 | Toray Ind Inc | 水なし平版印刷版 |
| JPH0743533B2 (ja) * | 1985-05-13 | 1995-05-15 | 富士写真フイルム株式会社 | ポジ型感光性平版印刷版 |
| JPH0766184B2 (ja) * | 1985-06-04 | 1995-07-19 | 住友化学工業株式会社 | ポジ型フオトレジスト組成物 |
| JP2614847B2 (ja) * | 1986-06-16 | 1997-05-28 | 東京応化工業 株式会社 | ポジ型感光性組成物 |
| JPS63161443A (ja) * | 1986-12-24 | 1988-07-05 | Sumitomo Chem Co Ltd | フオトレジスト組成物 |
| JPH0812422B2 (ja) * | 1987-05-06 | 1996-02-07 | 三菱化学株式会社 | ポジ型フォトレジスト組成物 |
| JP2563799B2 (ja) * | 1987-06-03 | 1996-12-18 | 日本ゼオン株式会社 | ポジ型フォトレジスト組成物 |
| JP2654947B2 (ja) * | 1987-07-16 | 1997-09-17 | 日本ゼオン株式会社 | ポジ型フォトレジスト組成物 |
| JP2640137B2 (ja) * | 1989-02-28 | 1997-08-13 | 富士写真フイルム株式会社 | ポジ型フオトレジスト組成物 |
| JP2619050B2 (ja) * | 1989-03-27 | 1997-06-11 | 東京応化工業株式会社 | ポジ型感光性組成物 |
| JPH02269348A (ja) * | 1989-04-10 | 1990-11-02 | Sumitomo Chem Co Ltd | フォトレジスト用組成物 |
| JPH0437851A (ja) * | 1990-06-04 | 1992-02-07 | Mitsubishi Kasei Corp | ポジ型フォトレジスト組成物 |
| JP2989064B2 (ja) * | 1991-12-16 | 1999-12-13 | 日本ゼオン株式会社 | 金属蒸着膜のパターン形成方法 |
| KR960008405A (ko) | 1994-08-10 | 1996-03-22 | 알베르투스 빌헬무스·요아네스 째스트라텐 | 광경화가능한 탄성중합체 조성물로부터의 플렉서 인쇄판 |
| JP2542800B2 (ja) * | 1995-05-29 | 1996-10-09 | 東京応化工業株式会社 | 半導体デバイス用レジストパタ―ンの製造方法 |
| JP3506295B2 (ja) | 1995-12-22 | 2004-03-15 | 富士写真フイルム株式会社 | ポジ型感光性平版印刷版 |
| JP4553140B2 (ja) | 2005-12-13 | 2010-09-29 | 信越化学工業株式会社 | ポジ型フォトレジスト組成物 |
-
1983
- 1983-02-04 JP JP1622583A patent/JPS59142538A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS59142538A (ja) | 1984-08-15 |
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